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Today’s Microelectronics
Industry is demanding increasingly high quality epitaxial wafers at very
competitive prices.
To meet this growing challenge, LPE put its 30 years of experience in epitaxial
reactor design and manufacture into developing the PE
3061 reactor.
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The new PE 3061
reactor’s chief characteristics can be summarized as follows:
- Wafer quality as close as possible to single wafer reactors
- Cost of ownership as close as possible to batch reactors
- Thick film deposition capability
- Typical applications include: new generation discrete technology,
PowerMos, IGBT, thin layers
The PE 3061 is a small batch reactor with
reduced wafer load to improve quality and short cycle time to maintain
a remarkable throughput.
PE 3061, the solution which meets the all
of the demands of today’s industry … a future reference point
in Epitaxial Technology. |
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